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Title page for ETD etd-03252019-031819


Type of Document Dissertation
Author Fain, Joshua Stephen
Author's Email Address joshua.s.fain@gmail.com
URN etd-03252019-031819
Title Fabrication, Characterization, and Applications of Porous Silicon Metal-Oxide Nanocomposites
Degree PhD
Department Electrical Engineering
Advisory Committee
Advisor Name Title
Sharon M. Weiss, Ph.D. Committee Chair
Cary L. Pint, Ph.D. Committee Member
Robert A. Reed, Ph.D. Committee Member
Ronald D. Schrimpf, Ph.D. Committee Member
Ya-Qiong Xu Committee Member
Keywords
  • porous silicon
  • nickel oxide
  • metal oxide
  • supercapacitor
  • memristor
  • nanoparticles
Date of Defense 2019-02-01
Availability restrictone
Abstract
Anodically etched porous silicon, which is characterized by aligned cylindrical pores in a silicon matrix, is an attractive material for applications in optics, energy, electronics, sensing, and biology. The porous silicon formation process allows for a high degree of control over the pore diameter and length, both of which can be tailored from the nanometer to micron scale. Functionalization of the pores with additional active materials provides the opportunity to further extend the capabilities and potential applications of porous silicon films. In this dissertation, I present my investigations of a nanocomposite materials system composed of porous silicon and transition metal oxides – nickel oxide and titanium dioxide. Fabrication is carried out based on thermal decomposition of the metal oxide precursor in a porous silicon film. The dependence of the physical properties of the nanocomposites on preparation conditions is characterized in detail. Promising applications of the nanocomposites for templated nanoparticle synthesis, variable conductivity, and electrochemical energy-storage are explored through rigorous experiments and analysis. In these studies, the porous silicon film not only provides a high surface area template for the growth of metal oxide nanoparticles, but also facilitates the opportunity to develop on-chip silicon integrated devices leveraging the properties of the metal oxide nanoparticles.

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