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Title page for ETD etd-07072014-142706

Type of Document Master's Thesis
Author Funkhouser, Erik David
Author's Email Address efunkh@gmail.com
URN etd-07072014-142706
Title Impact of Scaling on Energy Deposition in Sensitive Volumes Due to Direct Ionization by Space Radiation
Degree Master of Science
Department Electrical Engineering
Advisory Committee
Advisor Name Title
Robert Weller Committee Chair
Robert Reed Committee Member
  • radiation effects
  • vlsi
  • microelectronics
  • device physics
  • particle physics
  • monte carlo
  • mred
  • space
  • satellite
Date of Defense 2014-06-27
Availability unrestricted
In order to continue scaling to the deep sub-micron region, device manufacturers have replaced polysilicon gates with metal gate stacks and typically use metal clad or metal silicide source/drain regions. The metals used in modern processes tend to be considerably heavier than silicon, leading to a high-Z/low-Z interface in modern devices. The secondary electron environment at a high-Z/low-Z interface has already been shown to be significantly perturbed from equilibrium under x-ray and gamma-ray irradiation. However, the secondary electron environment at a high-Z/low-Z interface under ion irradiation has not previously been explored. This is significant to radiation effects analysis, because a departure from equilibrium limits the effectiveness of conventional analysis methods based on linear energy transfer (LET). This work utilizes the MRED and PENELOPE 2008 Monte Carlo tools to explore energy deposition due to direct ionization by ions in low-Z sensitive volumes near high-Z material, and it is concluded that the high-Z material does significantly perturb the energy deposition from the equilibrium case. MRED and PENELOPE 2008 are also used to explore the impact of shrinking sensitive volume sizes on energy deposition distributions. As sensitive volumes decrease in size, the variance in the energy deposited due to direct ionization by ions increases. It is shown that due to large variance in the energy deposition distribution, direct ionization by light ions which would not be expected to contribute to error rates on an LET basis can significantly impact error rates in a 22nm SOI SRAM technology.
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